Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Mask design compensation for sloped sidewall structures fabricated by X-ray lithography


    Contributors:
    Horade, M. (author) / Khumpuang, S. (author) / Fujioka, K. (author) / Sugiyama, S. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 13 , 3-4 ; 215-219


    Publication date :

    2007-01-01


    Size :

    5 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



    Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography

    Aigeldinger, G. / Yang, C. Y. / Skala, D. M. et al. | British Library Online Contents | 2008


    Compensation in vehicle sensor calibration for sloped vehicle calibration environment

    LEE DANIEL / ROHATGI ANKIT / CADIEN ADAM | European Patent Office | 2020

    Free access

    SLOPED FACE MONITORING SYSTEM AND SLOPED FACE MONITORING METHOD

    KOIZUMI KEIGO / ODA KAZUHIRO / SAKURATANI KEIJI | European Patent Office | 2019

    Free access

    Insulator sloped taping apparatus

    European Patent Office | 2021

    Free access

    A Si stencil mask for deep X-ray lithography fabricated by MEMS technology

    Mekaru, H. / Takano, T. / Ukita, Y. et al. | British Library Online Contents | 2008