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    Title :

    Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]



    Conference:

    Conference; 2nd, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2001 ; San Diego, CA



    Publication date :

    2001-01-01


    Size :

    17 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




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    Interferometric metrology of wafer nanotopography for advanced CMOS process integration (Invited Paper) [4449-21]

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