Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]


    Beteiligte:

    Kongress:

    Conference; 2nd, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2001 ; San Diego, CA



    Erscheinungsdatum :

    2001-01-01


    Format / Umfang :

    17 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]

    Boher, P. / Bucchia, M. / Piel, J. P. et al. | British Library Conference Proceedings | 2001


    Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool [4449-10]

    Boher, P. / Piel, J. P. / Stehle, J. L. et al. | British Library Conference Proceedings | 2001


    Nr. 4449

    DataCite | 1930


    Use of light scatter signals to identify particle material (Invited Paper) [4449-17]

    Stover, J. C. / Ivakhnenko, V. I. / Eremin, Y. A. et al. | British Library Conference Proceedings | 2001


    Interferometric metrology of wafer nanotopography for advanced CMOS process integration (Invited Paper) [4449-21]

    Valley, J. F. / Koliopoulos, C. L. / Tang, S. et al. | British Library Conference Proceedings | 2001