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    Title :

    Preparation of metal oxide thin films using coating photolysis process with ArF excimer laser [4088-51]


    Contributors:
    Tsuchiya, T. (author) / Watanabe, A. (author) / Imai, Y. (author) / Niino, H. (author) / Yabe, A. (author) / Yamaguchi, I. (author) / Manabe, T. (author) / Kumagai, T. (author) / Mizuta, S. (author) / Miyamoto, I.

    Conference:

    1st, International symposium on laser precision microfabrication ; 2000 ; Omiya, Japan



    Publication date :

    2000-01-01


    Size :

    4 pages


    Remarks:

    Described as proceedings. Also known as LPM 2000




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Excimer laser microfabrication and micromachining [4088-24]

    Gower, M. C. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    Present status of excimer laser exposure apparatus [4088-30]

    Suzuki, A. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    High-efficiency microdrilling of silicon wafer using excimer laser [4088-26]

    Asada, S. / Sano, T. / Miyamoto, I. et al. | British Library Conference Proceedings | 2000


    High-repetition-rate ArF excimer laser for microlithography [4088-80]

    Wakabayashi, O. / Enami, T. / Ishii, K. et al. | British Library Conference Proceedings | 2000


    Removal process of metal thin films during laser rear patterning [4088-101]

    Sano, T. / Miyamoto, I. / Japan Laser Processing Society et al. | British Library Conference Proceedings | 2000