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    Titel :

    Preparation of metal oxide thin films using coating photolysis process with ArF excimer laser [4088-51]


    Beteiligte:
    Tsuchiya, T. (Autor:in) / Watanabe, A. (Autor:in) / Imai, Y. (Autor:in) / Niino, H. (Autor:in) / Yabe, A. (Autor:in) / Yamaguchi, I. (Autor:in) / Manabe, T. (Autor:in) / Kumagai, T. (Autor:in) / Mizuta, S. (Autor:in) / Miyamoto, I.

    Kongress:

    1st, International symposium on laser precision microfabrication ; 2000 ; Omiya, Japan



    Erscheinungsdatum :

    01.01.2000


    Format / Umfang :

    4 pages


    Anmerkungen:

    Described as proceedings. Also known as LPM 2000




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Excimer laser microfabrication and micromachining [4088-24]

    Gower, M. C. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    Present status of excimer laser exposure apparatus [4088-30]

    Suzuki, A. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    High-efficiency microdrilling of silicon wafer using excimer laser [4088-26]

    Asada, S. / Sano, T. / Miyamoto, I. et al. | British Library Conference Proceedings | 2000


    High-repetition-rate ArF excimer laser for microlithography [4088-80]

    Wakabayashi, O. / Enami, T. / Ishii, K. et al. | British Library Conference Proceedings | 2000


    Removal process of metal thin films during laser rear patterning [4088-101]

    Sano, T. / Miyamoto, I. / Japan Laser Processing Society et al. | British Library Conference Proceedings | 2000