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    Titel :

    High-repetition-rate ArF excimer laser for microlithography [4088-80]


    Beteiligte:
    Wakabayashi, O. (Autor:in) / Enami, T. (Autor:in) / Ishii, K. (Autor:in) / Terashima, K. (Autor:in) / Itakura, Y. (Autor:in) / Watanabe, T. (Autor:in) / Ohta, T. (Autor:in) / Ohbu, A. (Autor:in) / Kubo, H. (Autor:in) / Tanaka, H. (Autor:in)

    Kongress:

    1st, International symposium on laser precision microfabrication ; 2000 ; Omiya, Japan



    Erscheinungsdatum :

    2000-01-01


    Format / Umfang :

    4 pages


    Anmerkungen:

    Described as proceedings. Also known as LPM 2000




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Micromachining with high-repetition-rate femtosecond laser sources [4088-12]

    Baubeau, E. / Le Harzic, R. / Jonin, C. et al. | British Library Conference Proceedings | 2000


    Excimer laser microfabrication and micromachining [4088-24]

    Gower, M. C. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    Present status of excimer laser exposure apparatus [4088-30]

    Suzuki, A. / Japan Laser Processing Society / Institute of Physical and Chemical Research et al. | British Library Conference Proceedings | 2000


    High-efficiency microdrilling of silicon wafer using excimer laser [4088-26]

    Asada, S. / Sano, T. / Miyamoto, I. et al. | British Library Conference Proceedings | 2000


    High-resolution contact lithography by excimer lasers [4088-73]

    Huang, H. / Lu, D. / Du, L. et al. | British Library Conference Proceedings | 2000