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    Title :

    Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser [3767-04]


    Contributors:
    Bollanti, S. (author) / Di Lazzaro, P. (author) / Flora, F. (author) / Letardi, T. (author) / Marinai, A. (author) / Nottola, A. (author) / Vigli-Papadaki, K. (author) / Vitali, A. (author) / Bonfigli, F. (author) / Lisi, N. (author)

    Conference:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Publication date :

    1999-01-01


    Size :

    12 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Nr. 3767

    DataCite | 1917


    Advanced krypton fluoride excimer laser for microlithography

    Ishihara, Toshihiko / Sandstrom, Richard L. / Reiser, Christopher et al. | SPIE | 1992


    High-power source and illumination system for extreme ultraviolet lithography [3767-20]

    Kubiak, G. D. / Bernardez, L. J. / Krenz, K. D. et al. | British Library Conference Proceedings | 1999


    High-repetition-rate ArF excimer laser for microlithography [4088-80]

    Wakabayashi, O. / Enami, T. / Ishii, K. et al. | British Library Conference Proceedings | 2000


    Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]

    Chen, Z. W. / Youngman, R. / Bievenue, T. et al. | British Library Conference Proceedings | 1999