Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot-wire chemical vapor deposition (HW-CVD) method: Role of substrate temperature
Solar energy materials & solar cells ; 91 , 8 ; 714-720
2007
Aufsatz (Zeitschrift)
Englisch
Hydrogenated amorphous silicon alloy deposition processes
TIBKAT | 1993
|High-rate deposition of hydrogenated amorphous silicon films using inductively coupled silane plasma
Online Contents | 2001
|Chemical-Vapor Deposition Of Silicon Carbide
NTRS | 1993
|