Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (mc-Si:H) by a hot-wire chemical vapor deposition (HWCVD) technique
Solar energy materials & solar cells ; 64 , 4
2000
Aufsatz (Zeitschrift)
Englisch
Lowering of thickness of boron-doped microcrystalline hydrogenated silicon film by seeding technique
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