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title: Optical metrology roadmap for the semiconductor, optical, and data storage industries
X-ray study of the roughness of surfaces and interfaces [4099-12]
X-ray study of surfaces and interfaces [4449-31]
X-ray investigations of a near surface layer of metal samples [4099-33]
Variable angle spectroscopic ellipsometry in the vacuum ultraviolet (Invited Paper) [4099-24]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Stitching interferometry of aspherical surfaces [4449-34]
Standardization in optics characterization (Invited Paper) [4099-14]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Quasi-confocal extended field surface sensing [4449-23]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Polarized light scattering from metallic particles on silicon wafers [4449-39]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]