A great amount of effort has been devoted to the constant improvement of basic performance factors of automobile such as drivability, safety and reliability, which result in clean exhaust emission and fuel economy. During the improvement processes, surface and thin-film techniques based on plasma technology played an important role in the practical applications of thin-film devices, sensors and surface modification. This review paper mainly provides the recent applications of plasma thin-film technique to electronics devices in automobile. The following examples are included. Firstly, the effect of water chemisorption on dielectric films on crystallographic orientation of sputter-deposited Ti films in Al-Si-Cu/Ti/TiN/Ti/dielectric structures was studied using RHEED and XRD. The results showed that water chemisorption has an influence on the preferred orientation of Ti and Al-Si-Cu films, resulting in excellent electromigration performance of the layered films. Secondly, hydrophobic surface treatment by sputtered thin films. Finally, future challenges to applications of plasma thin-film technology in automobiles will be discussed.
Review of plasma thin-film technology in automobile industry
1999
8 Seiten, 17 Quellen
Conference paper
English
Plasmaanwendung , Dünnschichtbauelement , Oberflächenbehandlung , dielektrische Schicht , Kristallorientierung , Elektromigration , Metallfilm , Aluminiumverbindung , Titan , Titannitrid , Chemisorption , Dünnschichttechnik , Oberflächentechnik , Kraftfahrzeugindustrie , Kraftfahrzeugelektronik , Übersichtsdarstellung , Aluminiumsiliciumkupferlegierung , Sputterabscheidung , RHEED-Beugung
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