The use of laser assisted chemistry for dry etching of semiconductors is described. Both direct laser-driven etching of GaAs and laser-enhanced plasma etching of Si are given as examples.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Laser-Assisted Dry Etching Of Semiconducting Materials


    Contributors:
    Brewer, P (author) / Holber, W (author) / Reksten, G (author) / Osgood, R M. (author)

    Conference:

    Laser-Assisted Deposition, Etching, and Doping ; 1984 ; Los Angeles,United States


    Published in:

    Publication date :

    1984-06-14





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    Deep UV laser-assisted cryo-etching of GaN

    Chih, M.C. / Chen, B.C. / Tsai, C.H. et al. | IEEE | 1997


    Polymer-Laser: Creating a Semiconducting-Polymer Laser

    Tessler, N. / Denton, G. J. / Friend, R. H. | British Library Online Contents | 1997



    Dual-wavelength semiconducting-polymer DFB laser

    Town, G.E. / Vasdekis, A. / Bain, F. et al. | IEEE | 2005


    Semiconductor Ring Lasers Fabricated with UV Laser-assisted Cryo-etching

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1997