Ion plating and sputtering offer materials engineers versatile coating methods. Both processes use a controlled pressure chamber and vacuum equipment. Sputtering is essentially a line of sight deposition method. The coating material is partially ionized, following electrical lines of force, during ion plating, uniformly coating the substrate configuration. Both processes-their applications and advantages-are discussed. Although the processes are not economically competitive with electroplating or other conventional coating methods, the properties they provide may offset the costs.


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    Title :

    Sputtering and Ion Plating as Industrial Processes


    Additional title:

    Sae Technical Papers


    Contributors:

    Conference:

    National Automobile Engineering Meeting ; 1973



    Publication date :

    1973-02-01




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




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