Ion plating and sputtering offer materials engineers versatile coating methods. Both processes use a controlled pressure chamber and vacuum equipment. Sputtering is essentially a line of sight deposition method. The coating material is partially ionized, following electrical lines of force, during ion plating, uniformly coating the substrate configuration. Both processes-their applications and advantages-are discussed. Although the processes are not economically competitive with electroplating or other conventional coating methods, the properties they provide may offset the costs.


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    Titel :

    Sputtering and Ion Plating as Industrial Processes


    Weitere Titelangaben:

    Sae Technical Papers


    Beteiligte:

    Kongress:

    National Automobile Engineering Meeting ; 1973



    Erscheinungsdatum :

    01.02.1973




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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