Inelastic scattering of laser light found to indicate onset of gas-phase polymerization in plasma-enhanced chemical-vapor deposition (PECVD) of photoconductive amorphous hydrogenated silicon/germanium alloy (a-SiGe:H) film. In PECVD process, film deposited from radio-frequency glow-discharge plasma of silane (SiH4) and germane (GeH4) diluted with hydrogen. Gas-phase polymerization undesirable because it causes formation of particulates and defective films.


    Access

    Access via TIB

    Check availability in my library


    Export, share and cite



    Title :

    Detection Of Gas-Phase Polymerization in SiH4 And GeH4


    Contributors:

    Published in:

    Publication date :

    1990-07-01



    Type of media :

    Miscellaneous


    Type of material :

    No indication


    Language :

    English