Impurities detected nondestructively during processing. In proposed system, surface of growing amorphous-silicon film monitored by ellipsometer at wavelength or combination of wavelengths at which impurity or impurities of interest absorb light strongly.


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    Title :

    Ellipsometric Monitoring of Film Deposition


    Contributors:

    Published in:

    Publication date :

    1986-07-01



    Type of media :

    Miscellaneous


    Type of material :

    No indication


    Language :

    English




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