Impurities detected nondestructively during processing. In proposed system, surface of growing amorphous-silicon film monitored by ellipsometer at wavelength or combination of wavelengths at which impurity or impurities of interest absorb light strongly.


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    Titel :

    Ellipsometric Monitoring of Film Deposition


    Beteiligte:
    Bickler, D. B. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    01.07.1986



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


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