Pair of reports present further experimental details of investigation of plasma deposition of films of phosphorous-doped amosphous silicon. Probe measurements of electrical resistance of deposited films indicated films not uniform. In general, it appeared that resistance decreased with film thickness.
Plasma Deposition of Doped Amorphous Silicon
NASA Tech Briefs ; 9 , 2
1985-10-01
Miscellaneous
No indication
English
Plasma Deposition of Amorphous Silicon
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