Inverse development process yields fine details. Photomicrographic technique produces images of integrated-circuit chips. Technique based on dark-field illumination: (chip lit with bright central spot of light and photographed by light scattered or diffracted from spot. Reveals more about microstructure patterns related to photoresist masking than more conventional bright-field method.


    Access

    Access via TIB

    Check availability in my library


    Export, share and cite



    Title :

    Analyzing Microchips With Dark-Field Negative Photomicrography


    Contributors:

    Published in:

    Publication date :

    1985-10-01



    Type of media :

    Miscellaneous


    Type of material :

    No indication


    Language :

    English