Inverse development process yields fine details. Photomicrographic technique produces images of integrated-circuit chips. Technique based on dark-field illumination: (chip lit with bright central spot of light and photographed by light scattered or diffracted from spot. Reveals more about microstructure patterns related to photoresist masking than more conventional bright-field method.
Analyzing Microchips With Dark-Field Negative Photomicrography
NASA Tech Briefs ; 9 , 2
1985-10-01
Miscellaneous
No indication
English
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