Inverse development process yields fine details. Photomicrographic technique produces images of integrated-circuit chips. Technique based on dark-field illumination: (chip lit with bright central spot of light and photographed by light scattered or diffracted from spot. Reveals more about microstructure patterns related to photoresist masking than more conventional bright-field method.


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    Titel :

    Analyzing Microchips With Dark-Field Negative Photomicrography


    Beteiligte:
    Suszko, S. F. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    01.10.1985



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


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