Method determines desirable direction to apply photoresist mask when fabricating semiconductor lasers. Method can be applied to finished wafer without affecting device yield.


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    Title :

    Crystal orientation for solid-state photolithography


    Contributors:

    Published in:

    Publication date :

    1977-03-01



    Type of media :

    Miscellaneous


    Type of material :

    No indication


    Language :

    English




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