Method determines desirable direction to apply photoresist mask when fabricating semiconductor lasers. Method can be applied to finished wafer without affecting device yield.
Crystal orientation for solid-state photolithography
NASA Tech Briefs ; 1 , 4
1977-03-01
Miscellaneous
No indication
English
Solid state laser for photolithography
SPIE | 1992
|IEEE | 2004
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British Library Online Contents | 1997
Interference photolithography with metamaterials
IEEE | 2008
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