In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures.


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    Title :

    Epitaxial thin films grown by pulsed laser deposition


    Contributors:


    Publication date :

    2005-01-01


    Size :

    306503 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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