In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures.
Epitaxial thin films grown by pulsed laser deposition
2005-01-01
306503 byte
Conference paper
Electronic Resource
English
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