In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures.


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    Titel :

    Epitaxial thin films grown by pulsed laser deposition


    Beteiligte:
    Blank, D.H.A. (Autor:in)


    Erscheinungsdatum :

    01.01.2005


    Format / Umfang :

    306503 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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