In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures.
Epitaxial thin films grown by pulsed laser deposition
01.01.2005
306503 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Electrochromic Mechanism in Nickel Oxide Thin Films Grown by Pulsed Laser Deposition
British Library Conference Proceedings | 2003
|Polycrystalline SrFe~1~2O~1~9 thin films grown by pulsed laser deposition [3572-13]
British Library Conference Proceedings | 1999
|Amorphous LiNiVO4 thin-film anode for microbatteries grown by pulsed laser deposition
Online Contents | 2007
|