Summary form only given. We present holographic diffraction from a broad-area thin-film holographic laser. The holographic laser is similar to a vertical-cavity surface-emitting laser (VCSEL) and consists of a 1 /spl mu/m thick GaAs active layer sandwiched between two 61.6 nm Al/sub 0.1/Ga/sub 0.9/As-AlAs 72.8 nm Bragg stacks, centered at 870 nm, with top and bottom periods of 5 and 10, respectively. No post-growth processing or fabrication is required.
Holographic vertical-cavity surface-emitting laser
1999-01-01
284539 byte
Conference paper
Electronic Resource
English
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