Simultaneous irradiation of F/sub 2/ and KrF excimer lasers was demonstrated for high-quality ablation and photo-sensitivity of fused silica. Micropatterns were formed on fused silica by both the etching and the refractive index modification with little surface damage.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    157 nm-248 nm multiwavelength excitation processing for application in optoelectronic manufacturing


    Contributors:
    Obata, K. (author) / Sugioka, K. (author) / Akane, T. (author) / Aoki, N. (author) / Toyoda, K. (author) / Midorikawa, K. (author)


    Publication date :

    2001-01-01


    Size :

    153388 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    157nm-248nm Multiwavelength Excitation Processing for Application in Optoelectronic Manufacturing

    Obata, K. / Sugioka, K. / Akane, T. et al. | British Library Conference Proceedings | 2001


    Multiwavelength Excitation Using Uv And VUV Laser System For High-quality Ablations

    Toyoda, K. / Sugioka, K. / Wada, S. et al. | IEEE | 1997


    Simultaneous multiwavelength switching for parallel information processing [3714-08]

    Mathason, B. K. / Delfyett, P. J. / SPIE | British Library Conference Proceedings | 1999



    Multiwavelength Properties of Blazars

    Urry, C. Megan | NTRS | 1998