Simultaneous irradiation of F/sub 2/ and KrF excimer lasers was demonstrated for high-quality ablation and photo-sensitivity of fused silica. Micropatterns were formed on fused silica by both the etching and the refractive index modification with little surface damage.
157 nm-248 nm multiwavelength excitation processing for application in optoelectronic manufacturing
2001-01-01
153388 byte
Conference paper
Electronic Resource
English
157nm-248nm Multiwavelength Excitation Processing for Application in Optoelectronic Manufacturing
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