Simultaneous irradiation of F/sub 2/ and KrF excimer lasers was demonstrated for high-quality ablation and photo-sensitivity of fused silica. Micropatterns were formed on fused silica by both the etching and the refractive index modification with little surface damage.


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    Titel :

    157 nm-248 nm multiwavelength excitation processing for application in optoelectronic manufacturing


    Beteiligte:
    Obata, K. (Autor:in) / Sugioka, K. (Autor:in) / Akane, T. (Autor:in) / Aoki, N. (Autor:in) / Toyoda, K. (Autor:in) / Midorikawa, K. (Autor:in)


    Erscheinungsdatum :

    01.01.2001


    Format / Umfang :

    153388 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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