In this presentation, the electrical and optical properties of In/sub 0.5/Ga/sub 0.5/As/GaAs QD LD grown with ALMBE are reported. In/sub 0.5/Ga/sub 0.5/As/GaAs QD LD was grown on [001]n-GaAs substrate. The total density of 3-stacked QD layers is /spl sim/5/spl times/10/sup 10//cm/sup 2/, and the average height and width of each QD are 7 and 45 nm, respectively. A room temperature photoluminescence (PL) peak is shown to have linewidth of 31.3 meV and the peak wavelength is about 1.24 /spl mu/m. Light-current curve of the broad area laser diode with 2 mm cavity length and 200 /spl mu/m width at temperature of 15 /spl deg/C was also shown. The current injection conditions were 1 /spl mu/s per 1 ms and the lasing threshold current is 2 A, which corresponds to a threshold current density of 500 A/cm/sup 2/. The external quantum efficiency is 40% while the internal quantum efficiency is 66% with a 45 cm/sup -1/ internal loss.


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    Title :

    The characteristics of 3-stacked InGaAs/GaAs quantum dot lasers grown by atomic layer molecular beam epitaxy


    Contributors:
    Heo, D. (author) / Song, J.D. (author) / Choi, W.J. (author) / Lee, J.I. (author) / Jeong, J. (author) / Han, I.K. (author)


    Publication date :

    2003-01-01


    Size :

    83777 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    The characteristic of 3-stacked InGaAs/GaAs QD (quantum dot) lasers grown by atomic layer molecular beam epitaxy

    Heo, D. / Song, J. D. / Choi, W. J. et al. | British Library Conference Proceedings | 2003



    Characteristics of InGaAs/GaAs/GaInP Quantum Well Lasers Grown by Gas-Source Molecular-Beam Epitaxy

    Zhang, G. / Ovtchinnikov, A. / Naeppi, J. et al. | British Library Conference Proceedings | 1992