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    Title :

    High-average-power, high-repetition-rate, injection-seeded 213 nm generation for optical microlithography


    Contributors:
    Kubota, S. (author) / Masuda, H. (author) / Kikuchi, H. (author) / Oka, M. (author) / Alexander, J. (author)


    Publication date :

    1997-01-01


    Size :

    325769 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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