We studied the possibility of the deposition of crystalline Ti:sapphire films on sapphire and quartz substrates at low temperatures by ablation using a KrF excimer laser. The structural properties of the films were analysed by X-ray diffraction and electron microprobe analysis. The luminescence was measured using a double grating monochromator. The excitation was performed by an Ar/sup +/ laser at 488 nm. The waveguiding properties of the film were measured by mode spectroscopy. From propagation constants the refractive index and thickness were calculated.


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    Title :

    Deposition of Ti:sapphire film on quartz and sapphire substrates by laser


    Contributors:
    Lancok, J. (author) / Jelinek, M. (author) / Oswald, J. (author)


    Publication date :

    1999-01-01


    Size :

    109864 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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