We studied the possibility of the deposition of crystalline Ti:sapphire films on sapphire and quartz substrates at low temperatures by ablation using a KrF excimer laser. The structural properties of the films were analysed by X-ray diffraction and electron microprobe analysis. The luminescence was measured using a double grating monochromator. The excitation was performed by an Ar/sup +/ laser at 488 nm. The waveguiding properties of the film were measured by mode spectroscopy. From propagation constants the refractive index and thickness were calculated.


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    Titel :

    Deposition of Ti:sapphire film on quartz and sapphire substrates by laser


    Beteiligte:
    Lancok, J. (Autor:in) / Jelinek, M. (Autor:in) / Oswald, J. (Autor:in)


    Erscheinungsdatum :

    01.01.1999


    Format / Umfang :

    109864 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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