We report our results of UV-laser ablated Si surface gratings. It was found that different laser-matter interactions were involved in forming the surface gratings when different levels of laser power were used. Hence, different morphologies of gratings were observed. In fabricating a grating, a silicon wafer was exposed to the interference fringes formed through a prism or a holographic system with the fourth-harmonic (266 nm) of a Q-switched Nd:YAG laser.
Formation mechanism dependence on laser power of UV-laser ablated silicon surface gratings
1999-01-01
274455 byte
Conference paper
Electronic Resource
English
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