We report our results of UV-laser ablated Si surface gratings. It was found that different laser-matter interactions were involved in forming the surface gratings when different levels of laser power were used. Hence, different morphologies of gratings were observed. In fabricating a grating, a silicon wafer was exposed to the interference fringes formed through a prism or a holographic system with the fourth-harmonic (266 nm) of a Q-switched Nd:YAG laser.


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    Title :

    Formation mechanism dependence on laser power of UV-laser ablated silicon surface gratings


    Contributors:
    Cheng-Yen Chen, (author) / Gurtler, S. (author) / Yang, C.C. (author)


    Publication date :

    1999-01-01


    Size :

    274455 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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