We report our results of UV-laser ablated Si surface gratings. It was found that different laser-matter interactions were involved in forming the surface gratings when different levels of laser power were used. Hence, different morphologies of gratings were observed. In fabricating a grating, a silicon wafer was exposed to the interference fringes formed through a prism or a holographic system with the fourth-harmonic (266 nm) of a Q-switched Nd:YAG laser.


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    Titel :

    Formation mechanism dependence on laser power of UV-laser ablated silicon surface gratings


    Beteiligte:
    Cheng-Yen Chen, (Autor:in) / Gurtler, S. (Autor:in) / Yang, C.C. (Autor:in)


    Erscheinungsdatum :

    01.01.1999


    Format / Umfang :

    274455 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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