Femtosecond laser ablation of silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.


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    Title :

    Femtosecond laser ablation of silicon (100) with thermal oxide thin films of varying thickness


    Contributors:
    McDonald, J.P. (author) / Ray, K.E. (author) / Mistry, V.R. (author) / Mourou, G. (author) / Yalisove, S.M. (author)


    Publication date :

    2005-01-01


    Size :

    2015604 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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