The paper investigates both conventional "top-down" engineering approaches for chalcogenide glass-based photonic chip fabrication using contact printing and reactive ion etching as well as an alternative method for smaller structure that uses a focused ion beam (FIB) mill. This latter approach provides a versatile, one-step method of patterning chalcogenide films at the nanometer scale to create photonic crystals, waveguide tapers, gratings, micro-ring resonators, etc, whereas conventional pattern transfer and ICP reactive ion etching (RIE) allows larger structures to be fabricated.


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    Title :

    Chalcogenide glass photonic devices


    Contributors:
    Luther-Davies, B. (author) / Freeman, D. (author) / Ruan, Y. (author) / Madsen, N. (author) / Madden, S. (author) / Jarvis, R. (author) / Rode, A. (author) / Samoc, M. (author)


    Publication date :

    2004-01-01


    Size :

    112478 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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