The paper investigates both conventional "top-down" engineering approaches for chalcogenide glass-based photonic chip fabrication using contact printing and reactive ion etching as well as an alternative method for smaller structure that uses a focused ion beam (FIB) mill. This latter approach provides a versatile, one-step method of patterning chalcogenide films at the nanometer scale to create photonic crystals, waveguide tapers, gratings, micro-ring resonators, etc, whereas conventional pattern transfer and ICP reactive ion etching (RIE) allows larger structures to be fabricated.
Chalcogenide glass photonic devices
01.01.2004
112478 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Chalcogenide Glass Photonic Devices
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