This paper deals about the high spatial resolution technique of argon plasma based quantum well intermixing using Si/sub 3/N/sub 4/ as the thermal stress-induced annealing mask in InGsAs/InGaAsP laser structure.


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    Title :

    High spatial resolution of argon plasma-based quantum well intermixing using thermal stress-induced mask in InGaAs/InGaAsP laser structure


    Contributors:
    Djie, H.S. (author) / Arokiaraj, J. (author) / Mei, T. (author) / Ng, S.L. (author)


    Publication date :

    2003-01-01


    Size :

    97055 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English