Chemical vapor deposition (CVD) is a new technology for preparing inorganic materials which possess some advantages, such as lower preparation temperature, uniform and compact microstructure, and near-size molding, so it is one of the common methods to prepare functional ceramics. In the paper, several common chemical vapor deposition methods like atmospheric chemical vapor deposition, low-pressure chemical vapor deposition, plasma-enhanced chemical vapor deposition and laser-assisted chemical vapor deposition are reviewed, because the microstructure and performance of functional ceramics are greatly influenced by their fabrication methods. In addition, the deposition parameters of Si-C-N absorbing ceramics which are deposited at lower temperature by low-pressure chemical vapor deposition are optimized. It is proposed that low-pressure chemical vapor deposition is the main method for preparing the advanced EMW absorbing ceramics.


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    Title :

    Research progress on SiCN ceramic prepared at low temperature by chemical vapor deposition


    Contributors:
    MU Yangyang (author) / TU Jianyong (author) / XUE Jimei (author) / YE Fang (author) / CHENG Laifei (author)


    Publication date :

    2019




    Type of media :

    Article (Journal)


    Type of material :

    Electronic Resource


    Language :

    Unknown