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    Title :

    Reactive Flow in Halide Chemical Vapor Deposition of Silicon Carbide Epitaxial Films


    Contributors:
    Wang, Rong (author) / Ma, Ronghui (author)

    Published in:

    Publication date :

    2008-10-01




    Type of media :

    Article (Journal)


    Type of material :

    Electronic Resource


    Language :

    English