Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Concept of Ultra-Vacuum No-Lithography MBE Technologies for 3D Nanoelectronic CBFE ULSI/WSI on Spacefabs


    Contributors:

    Conference:

    NanoTech 2002 - "At the Edge of Revolution" ; 2002 ; Houston , Texas



    Publication date :

    2002-01-01




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




    AIAA-2002-5750 Concept of Ultra-Vacuum No-Lithography MBE Technologies for 3D Nanoelectronic CBFE ULSI/WSI on Spacefabs

    Bubennikov, A. / American Institute of Aeronautics and Astronautics | British Library Conference Proceedings | 2002


    Excimer lithography for ULSI

    Miyaji, A. / Suzuki, K. / Tanimoto, A. | British Library Online Contents | 1993


    Nanoelectronic Modeling at JPL

    Klimeck, G. / Bowen, C. / Boykin, T. et al. | NTRS | 1998


    Simulator Development for Nanoelectronic Devices

    Klimeck, G. / Bowen, R. / Cwik, T. | NTRS | 1999


    Optical Interconnection for ULSI Technology Innovation

    Iwata, A. | British Library Online Contents | 1994