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    Title :

    Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering


    Contributors:
    Grosser, M. (author) / Münch, M. (author) / Brenner, J. (author) / Wilke, M. (author) / Seidel, H. (author) / Bienert, C. (author) / Roosen, A. (author) / Schmid, U. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 16 , 5 ; 825-836


    Publication date :

    2010-01-01


    Size :

    12 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83