Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    High-power laser-produced plasma source for nanolithography [5196-10]


    Contributors:

    Conference:

    Conference, Laser-generated and other laboratory X-ray and EUV sources, optics and applications; Laser-generated and other laboratory X-ray and EUV sources, optics and applications



    Publication date :

    2004-01-01


    Size :

    12 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]

    Endo, A. / Abe, T. / Suganuma, T. et al. | British Library Conference Proceedings | 2004


    Study on EUV emission properties of laser-produced plasma at ILE, Osaka [5196-33]

    Nakai, M. / Nishimura, H. / Shigemori, K. et al. | British Library Conference Proceedings | 2004


    X-pinch source size measurements [5196-04]

    Pikuz, S. A. / Song, B. M. / Shelkovenko, T. A. et al. | British Library Conference Proceedings | 2004


    Overview of x-ray spectroscopy of laser-produced plasmas (Invited Paper) [5196-19]

    Rosmej, F. B. / Faenov, A. Y. / Pikuz, T. A. et al. | British Library Conference Proceedings | 2004


    X-ray and EUV spectral instruments for plasma source characterization [5196-32]

    Shevelko, A. P. / Kasyanov, Y. S. / Knight, L. V. et al. | British Library Conference Proceedings | 2004