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    Titel :

    High-power laser-produced plasma source for nanolithography [5196-10]


    Beteiligte:
    Forber, R. A. (Autor:in) / Gaeta, C. J. (Autor:in) / Rieger, H. (Autor:in) / Siegert, H. (Autor:in) / McLeod, S. (Autor:in) / Boerger, B. E. (Autor:in) / Kyrala, George A. / SPIE

    Kongress:

    Conference, Laser-generated and other laboratory X-ray and EUV sources, optics and applications; Laser-generated and other laboratory X-ray and EUV sources, optics and applications



    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    12 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]

    Endo, A. / Abe, T. / Suganuma, T. et al. | British Library Conference Proceedings | 2004


    Study on EUV emission properties of laser-produced plasma at ILE, Osaka [5196-33]

    Nakai, M. / Nishimura, H. / Shigemori, K. et al. | British Library Conference Proceedings | 2004


    X-pinch source size measurements [5196-04]

    Pikuz, S. A. / Song, B. M. / Shelkovenko, T. A. et al. | British Library Conference Proceedings | 2004


    Overview of x-ray spectroscopy of laser-produced plasmas (Invited Paper) [5196-19]

    Rosmej, F. B. / Faenov, A. Y. / Pikuz, T. A. et al. | British Library Conference Proceedings | 2004


    Liquid-metal-jet anode x-ray source [5196-50]

    Hemberg, O. E. / Otendal, M. / Hertz, H. M. et al. | British Library Conference Proceedings | 2004