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    Titel :

    Study on EUV emission properties of laser-produced plasma at ILE, Osaka [5196-33]


    Beteiligte:
    Nakai, M. (Autor:in) / Nishimura, H. (Autor:in) / Shigemori, K. (Autor:in) / Miyanaga, N. (Autor:in) / Norimatsu, T. (Autor:in) / Nagai, K. (Autor:in) / Matsui, R. (Autor:in) / Hibino, T. (Autor:in) / Okuno, T. (Autor:in) / Sohbatzadeh, F. S. (Autor:in)

    Kongress:

    Conference, Laser-generated and other laboratory X-ray and EUV sources, optics and applications; Laser-generated and other laboratory X-ray and EUV sources, optics and applications



    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    9 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    High-power laser-produced plasma source for nanolithography [5196-10]

    Forber, R. A. / Gaeta, C. J. / Rieger, H. et al. | British Library Conference Proceedings | 2004


    Overview of x-ray spectroscopy of laser-produced plasmas (Invited Paper) [5196-19]

    Rosmej, F. B. / Faenov, A. Y. / Pikuz, T. A. et al. | British Library Conference Proceedings | 2004


    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]

    Endo, A. / Abe, T. / Suganuma, T. et al. | British Library Conference Proceedings | 2004


    Hard x-ray emission from intense femtosecond laser-solid target interactions [5196-38]

    Chen, L. M. / Forget, P. / Toth, R. et al. | British Library Conference Proceedings | 2004


    Micro x-ray sources from femtosecond laser plasmas [5196-39]

    Serbanescu, C. G. / Santiago, J. / Fedosejevs, R. et al. | British Library Conference Proceedings | 2004