Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration [4944-42]
Conference, Integrated optical devices: fabrication and testing ; 2002 ; Brugge, Belgium
2003-01-01
9 pages
Conference paper
English
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
DataCite | 1940
Improvement of sidewall roughness in deep silicon etching
British Library Online Contents | 2000
|Design of an instrinsic bistable optical device fabricated by hybrid integration on glass [4944-20]
British Library Conference Proceedings | 2003
|Optimal design of waveguiding periodic structures [4944-53]
British Library Conference Proceedings | 2003
|Tunable liquid crystal Fabry-Perot filters [4944-36]
British Library Conference Proceedings | 2003
|