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    Titel :

    Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration [4944-42]



    Kongress:

    Conference, Integrated optical devices: fabrication and testing ; 2002 ; Brugge, Belgium



    Erscheinungsdatum :

    01.01.2003


    Format / Umfang :

    9 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Nr. 4944

    DataCite | 1940


    Improvement of sidewall roughness in deep silicon etching

    Chabloz, M. / Sakai, Y. / Matsuura, T. et al. | British Library Online Contents | 2000


    Optimal design of waveguiding periodic structures [4944-53]

    Diana, R. / Giorgio, A. / Perri, A. G. et al. | British Library Conference Proceedings | 2003


    Design of an instrinsic bistable optical device fabricated by hybrid integration on glass [4944-20]

    Mateo, E. F. / Montero, C. / Moreno, V. et al. | British Library Conference Proceedings | 2003


    Tunable liquid crystal Fabry-Perot filters [4944-36]

    Vogel, W. / Berroth, M. / International Society for Optical Engineering | British Library Conference Proceedings | 2003