Characterization of internal stress of silicon oxinitride thin films fabricated by plasma-enhanced chemical vapor deposition: applications in integrated optics [4596-03]
Conference; 2nd, Advanced photonic sensors and applications ; 2000 ; Singapore
2001-01-01
7 pages
Conference paper
English
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
DataCite | 1933
Thin films residual stress measurement by optical profilometry [4596-02]
British Library Conference Proceedings | 2001
|Multichannel 3D profilometry [4596-27]
British Library Conference Proceedings | 2001
|Switching property of sol-gel vanadium oxide thin films [4596-04]
British Library Conference Proceedings | 2001
|Dynamic phase-shift photoelasticity [4596-44]
British Library Conference Proceedings | 2001
|