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    Title :

    Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence [4146-10]


    Contributors:
    Wang, Z. (author) / Kun, C. (author) / Ma, Y. (author) / Chen, B. (author) / Cao, J. (author) / Zhou, Z. (author) / Chen, X. (author) / Michette, A. G. (author) / Kaiser, W. M. / Stulen, R. H.

    Conference:

    Conference, Soft x-ray and EUV imaging systems ; 2000 ; San Diego, CA



    Publication date :

    2000-01-01


    Size :

    8 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




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    Nr. 4146

    DataCite | 1925


    Multilayer reflectance during exposure to EUV radiation [4146-07]

    Oestreich, S. / Klein, R. / Scholze, F. et al. | British Library Conference Proceedings | 2000


    Broadband normal-incidence aperiodic multilayer mirrors for soft x-ray dispersive spectroscopy: theory and implementation [4782-24]

    Ragozin, E. N. / Kondratenko, V. V. / Levashov, V. E. et al. | British Library Conference Proceedings | 2002


    Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability [4146-06]

    Louis, E. / Yakshin, A. E. / Gorts, P. C. et al. | British Library Conference Proceedings | 2000