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    Title :

    Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]



    Conference:

    Conference, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2000 ; San Diego, CA



    Publication date :

    2000-01-01


    Size :

    6 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Nr. 4099

    DataCite | 1924


    In-situ ellipsometric measurements of thin film aluminum oxidation [4099-26]

    Lindmark, E. K. / Nowak, J. J. / Kief, M. T. et al. | British Library Conference Proceedings | 2000


    Calibration tool for a CCD-camera-based vision system [4099-19]

    Xu, G. / Tan, S. L. / Low, S. P. et al. | British Library Conference Proceedings | 2000


    Standardization in optics characterization (Invited Paper) [4099-14]

    Ristau, D. / SPIE | British Library Conference Proceedings | 2000


    Optical characterization of doping profiles in silicon [4099-04]

    Bernini, R. / Zeni, L. / Pierri, R. et al. | British Library Conference Proceedings | 2000