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    Title :

    Influence of post-exposure bake on resist contrast [2195-55]


    Contributors:

    Conference:

    11th Conference, Advances in resist technology and processing XI ; 1994 ; San Jose; CA



    Publication date :

    1994-01-01


    Size :

    12 pages


    Remarks:

    Held in conjunction with the symposium on microlithography




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Nr. 2195

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