New procedure for the optical characterization of high-quality thin films [4099-16]
Fast-scanning ellipsometry for thin film characterization [4099-39]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Investigation on total scattering at 157 nm and 193 nm [4099-09]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Microroughness analysis of thin film components for VUV applications [4099-13]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
In-situ ellipsometric measurements of thin film aluminum oxidation [4099-26]
Optical characterization of doping profiles in silicon [4099-04]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Calibration tool for a CCD-camera-based vision system [4099-19]